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Title:

Effect of Exposure Conditions and Internal Curing on Pore Water Potential Development in Cement-Based Materials

Accession Number:

01757390

Record Type:

Component

Availability:

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Order URL: http://worldcat.org/issn/03611981

Abstract:

Moisture availability is a crucial factor for ongoing hydration reactions and controlling capillary pore water potential (PWP) development in cement-based mixtures. Harsh exposure conditions (such as low relative humidity, high temperature, or high wind speed) or incorporating fine cementitious materials may increase the mixture susceptibility to PWP development, and thus, early-age shrinkage. This study aims to investigate PWP and electrical conductivity development in cement paste and mortar mixtures with various water-to-cement ratios (from 0.25 to 0.4), silica fume substitutions, and internal curing in both sealed and harsh exposure conditions (ambient temperature from 10 to 35°C and relative humidity from 25% to 75%). The results indicate that high ambient temperature and silica fume incorporation substantially accelerate moisture loss and PWP development. The outcome of this study also shows the capability of internal curing using lightweight fine aggregate to delay PWP development in mixtures containing silica fume or exposure to low relative humidity and high-temperature ambient environments.

Supplemental Notes:

The results and conclusions do not reflect the opinion of the sponsors. © National Academy of Sciences: Transportation Research Board 2020.

Language:

English

Authors:

Vosoughi, Payam
Taylor, Peter
Najimi, Meysam
Horton, Robert

Pagination:

pp 184-191

Publication Date:

2021-1

Serial:

Transportation Research Record: Journal of the Transportation Research Board

Volume: 2675
Issue Number: 1
Publisher: Sage Publications, Incorporated
ISSN: 0361-1981
EISSN: 2169-4052
Serial URL: http://journals.sagepub.com/home/trr

Media Type:

Web

Features:

References (33)

Subject Areas:

Bridges and other structures; Highways; Materials; Pavements

Files:

TRIS, TRB, ATRI

Created Date:

Nov 5 2020 3:04PM

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